SiC membrane/SiN membrane

This is a SiC or SiN thin film membrane used as a standard sample holder for X-ray analysis and electron beam analysis (SEM, TEM).

It can be customized to suit your needs as shown below.

• Metal thin film formation for use as a thin film target or beam splitter.
• Slit/pinhole formation for use as a beam shaping element.
• Sub-50 nm thick membrane (SiN) for use as soft X-ray or electron beam transmission element

Standard product specifications

	SiC	SiN (Insulating)
Material	Amorphous or polycrystalline	Amorphous SiN
thickness	100 nm - 2 μm	50 nm - 2 μm
window size	0.1 mm to 10 mm square (depending on film thickness)
Cutting chip size	2.1 mm - 20 mm Square
Frame Thickness	0.2 mm - 0.625mm
substrate	Diameter 4 inches Si substrate
option	Metal coating, slit/pinhole formation

Usage

• Sample holder for X-ray, electron beam, and EUV analysis
• Liquid cell window material for chemical and biological analysis
• vacuum window
• Support material for transmission type X-ray optical element

Production example