This is a SiC or SiN thin film membrane used as a standard sample holder for X-ray analysis and electron beam analysis (SEM, TEM).
It can be customized to suit your needs as shown below.
![SiN membrane](https://keytech.ntt-at.co.jp/nano/p0021_5.jpg)
dicing mold
It can be customized to suit your needs as shown below.
- Metal thin film formation for use as a thin film target or beam splitter.
- Slit/pinhole formation for use as a beam shaping element.
- Sub-50 nm thick membrane (SiN) for use as soft X-ray or electron beam transmission element
Standard product specifications
SiC | SiN (Insulating) | |
---|---|---|
Material | Amorphous or polycrystalline | Amorphous SiN |
thickness | 100 nm - 2 μm | 50 nm - 2 μm |
window size | 0.1 mm to 10 mm square (depending on film thickness) | |
Cutting chip size | 2.1 mm - 20 mm Square | |
Frame Thickness | 0.2 mm - 0.625mm | |
substrate | Diameter 4 inches Si substrate | |
option | Metal coating, slit/pinhole formation |
Usage
- Sample holder for X-ray, electron beam, and EUV analysis
- Liquid cell window material for chemical and biological analysis
- vacuum window
- Support material for transmission type X-ray optical element
Production example
![SiN membrane](https://keytech.ntt-at.co.jp/nano/p0021_5.jpg)
dicing mold
![SiN membrane wafer](https://keytech.ntt-at.co.jp/nano/images/p0021_SiC_membrane_wafer.png)
wafer type