Feature
Mo/Si multilayer mirror
We provide EUV mirrors that reflect EUV light with photon energy 10 eV - 1 keV (wavelength 120 nm - 1.2 nm) with high efficiency. This energy band mirror, also called soft X-ray or XUV light, is used in a wide range of fields such as industrial applications such as EUV lithography, ultra-high-speed physical and chemical research using high-order harmonics, astrophysics applications, and soft X-ray plasma observation. It is
Multilayer film mirrors are mainly used for direct incidence, and single-layer film mirrors are mainly used for oblique incidence.
Multilayer film mirrors are mainly used for direct incidence, and single-layer film mirrors are mainly used for oblique incidence.
Design example
Mo/Si multilayer mirror, incident angle 0 degree
Ru single layer mirror, incident angle 80 degrees
- Click here for multilayer film mirror design examples in each energy range
- Click here for single-layer film mirror design examples in each energy range
Typical specifications
We will design the substrate shape and coating according to your request.
Typical specifications | |
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Maximum size | Diameter 3mm - 450mm |
mirror shape | Plane, Concave, Cylindrical, Parabolic, Spheroidal, Toroidal |
multilayer material | Ru/B4C, Mo/Si, Zr/AlSi, SiC/Mg, W/B4C |
single layer material | Ru, B4C, C, Ni, Au |
Download materials
Multilayer Coating for Extreme Ultraviolet Experiments (English, white paper) | 615KB | download |
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Please contact us
Please feel free to contact us for inquiries such as an estimate.