Feature
W/B4C multilayer film polarizer
In the EUV region and soft X-ray region, where the refractive index of the material is close to 1, the Brewster's angle is around 45 degrees. Therefore, the multilayer mirror for use around 45 degrees has a high reflectance only for s-polarized light and also functions as a polarizer. Utilizing this characteristic, we offer multilayer film polarizers with sufficient efficiency from approximately 30 eV to 800 eV (1.5 nm - 40 nm).
These multilayer film polarizers are used not only for physical property experiments using synchrotron radiation and high-order harmonics, but also for basic research for industrial applications such as EUV lithography.
These multilayer film polarizers are used not only for physical property experiments using synchrotron radiation and high-order harmonics, but also for basic research for industrial applications such as EUV lithography.
Design example
Solid line: s-polarized light, dashed line: p-polarized light
Polarizer for energy 60 eV
Polarizer for energy 90 eV
Polarizer for dependent energy 150 eV
Polarizer for energy 300 eV
Typical specifications
We will design the substrate shape and coating according to your request.
| Typical specifications | |
|---|---|
| base size | 10mm x 10mm x 1mm thickness |
| Substrate material | Si |
| multilayer material | SiC/Mg, Zr/AlSi, Mo/Si, Ru/B4C, W/B4C |
| Compatible energy range | 30 eV - 800 eV |
Please contact us
Please feel free to contact us for inquiries such as an estimate.
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