Nanoimprint mold custom

Nanoimprint mold microfabrication technology and manufacturing know-how

■ Mold material

Materials such as quartz, silicon, SiC, and Ni can be specified according to the customer's nanoimprint.

■ Extremely fine

From minimum 20nm pattern to μm order. High aspect ratios are also possible.

■ Pattern

We can handle everything from repeated arrays of single patterns to complex patterns such as circuit patterns.

■ Multi-step pattern

We also offer multi-level stepped patterns for holograms, etc.

■ Three-dimensional shape

Various shapes such as minute microlens arrays (MLA), antireflection bodies (moth-eye structures), and inverted square pyramid patterns are processed.

■ High shape accuracy

The processing shape is also evaluated as a sharp edge. We also support tapered and reverse tapered microstructures by side wall control. Please contact us.

Flow of nanoimprint mold production request

Please feel free to contact us

Prior consultation is very important for custom molds. First of all, please contact us with your wishes and images. We will carefully respond to detailed consultations and questions.
 

Custom mold Fine pattern processing example

This is an example of NTT-AT 's microfabrication of nanoimprint molds of various shapes and sizes. Please feel free to contact us regarding your desired pattern, substrate type, etc.

Ultra-fine pattern	high aspect ratio pattern
36nm pitch dot	aspect ratio 10
Substrate: quartz, silicon, SiO2/Si, Ni, SiC Minimum pattern pitch: Approximately 35 nm (minimum pitch varies depending on the substrate and pattern.) Depth: from 20nm Patterns: L&S, dots, holes, rings	Substrate: Silicon Pattern pitch: from 50nm Depth: from 100nm Pattern: Line, L&S

multilevel pattern	V-groove type, blaze type pattern
8 level pattern	1 μm pitch V groove
Substrate: quartz, silicon, SiO2/Si, Ni electroforming Minimum pattern: from 250nm Number of levels: Up to 8 levels Level depth: from 50nm Total depth: up to 20μm	Substrate: Silicon Pattern pitch: from 100nm Depth: from 50nm

Conical pattern (Moth-eye structure)	Spherical pattern (microlens)
8 level pattern	1 μm, zag 0.3 μm
Substrate: Quartz, Ni electroformed Pattern pitch: from 200nm Depth: 100 to 1000nm Array: square array, triangular array, random array	Substrate: quartz, silicon, SiO 2 /Si, Ni electroformed Pattern pitch: 1 to 250nm Shape: Spherical Array: square array, triangular array, random array

quadrangular pyramid pattern	Fukahori Pattern
square pyramid pattern array	40 μm height cylindrical pattern
Substrate: Silicon Pattern pitch: from 500nm Depth: from 300nm	Substrate: Quartz Depth: up to 100 μm