X-ray diffraction grating

Feature

NTT-AT 's phase gratings and absorption gratings for X-ray Talbot imaging are manufactured based on high aspect ratio Si etching technology and Au plating technology, and achieve sufficiently high X-ray radiation resistance compared to conventional photoresist gratings. In addition, they reduce the deterioration of the measurement environment due to debris generation.

• Phase grating: Si structure with low roughness and high perpendicularity
• Absorption grating: Au-plated absorber embedded in a Si structure with low roughness and high verticality

Standard product specifications

	Absorption grating	Phase Grating
material	Absorption part: Au, transmission part: Si	Phase modulation section: Si
membrane	Silicon, thickness 50 μm	Silicon, thickness 50 μm
Pitch/Height	3 μm / 10 μm	2 μm / 20 μm
Maximum Area	10mm square	40mm square

*Products can be customized.

Please contact us

Please feel free to contact us for inquiries such as an estimate.