Ru/B4C multilayer mirror (150 eV - 100 eV)
for 150 eV
33% reflectance, 3.1 eV bandwidth
Reflectance 31%, bandwidth 1.9 eV
for 120 eV
Reflectance 40%, bandwidth 2.2 eV
Reflectance 40%, bandwidth 4.5 eV
for 100 eV
Reflectance 41%, bandwidth 3.3 eV
Reflectance 41%, bandwidth 6.6 eV
Mo/Si multilayer mirror (95 eV - 70 eV)
for 90 eV
68% reflectance, 3.5 eV bandwidth
67% reflectance, 6.1 eV bandwidth
for 80 eV
Reflectance 61%, bandwidth 3.1 eV
60% reflectance, 7.7 eV bandwidth
Zr/AlSi multilayer mirror (70 eV - 50 eV)
for 70 eV
Reflectance 59%, bandwidth 2.8 eV
Reflectance 59%, bandwidth 4.4 eV
for 60 eV
Reflectance 49%, bandwidth 3.3 eV
Reflectance 49%, bandwidth 6.3 eV
for 50 eV
Reflectance 32%, bandwidth 4.9 eV
Reflectance 32%, bandwidth 9.6 eV
SiC/Mg multilayer mirror (45 eV - 20 eV)
for 40 eV
Reflectance 48%, bandwidth 2.5 eV
Reflectance 48%, bandwidth 3.0 eV
for 30 eV
Reflectance 44%, bandwidth 3.1 eV
45% reflectance, 3.8 eV bandwidth
for 20 eV
Reflectance 41%, bandwidth 3.1 eV
46% reflectance
Standard product specifications
| Standard model | EUVML-(a)-(b)-(c)-(d)-(e)(f) |
|---|---|
| (a) Multilayer film material | Ru/B4C, Mo/Si, Zr/AlSi, SiC/Mg |
| (b) Reflective type | H: High Reflectivity, N: Narrowband, B: Broadband |
| (c) Incident angle | 0 degrees - 60 degrees |
| (d) central energy | 20 eV - 150 eV (60 nm - 8 nm) |
| (b) Substrate size | 1025: 1 inch diameter x 0.25 inch thick 0525: 0.5" diameter x 0.25" thick |
| (c) Substrate type | F: flat, C: concave (curvature radius 100 mm - 3000 mm) |
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